Single Crystalline Substrates for Films

Film technologies are becoming more and more important for the development of modern science and technologies. The development of film technology needs various and high quality single crystalline substrates. Firstly, the cell parameter of the substrate must match with the film to be grown on the substrate vary well, so that only special single crystal which has certain lattice constant, correct orientation and high fabrication accuracy can be used for the film. Secondly, the substrate crystal must be structure perfect, crystal structure defect such as twin and inclusion must be as few as possible. The surface of the substrate must be polished to very high flatness and micro roughness (the test result of AFM should be better than a few angstrom in an 5x5um area for example). The substrate must be able to stand to high, low temperature and chemical environment during the film growth and use process. Also some physical, mechanical properties are necessary for the substrate. For example, the microwave dielectric loss must be very low for the substrates used in microwave communication.

We can deliver various substrate such as SrTiO₃、MgO、LaAlO₃、Al₂O₃、ZrO₂、LSAT、LiGaO₂、LiAlO₂、GGG、BaTiO_3.