NLO & OTHER CRYSTALS
  GaAs

  ZnSe

  Ge

  Si

  Sapphire

  Quartz

  NaCl

  CaCO3

  LiF

  BaF2

  MgF2

  CaF2

  LiNbO3

  BaTiO3

  LiIO3

  KNbO3

  DKDP

  BBO

  KTP

 
  Sapphire  
 

α-Al2O3 (Sapphire)

Sapphire is an excellent multi-functional material, it has high thermal conductivity, hardness, IR transmission, high stability in different chemical atmosphere and is able to stand high temperature, so it is widely used in many areas like science, technology, industry and defense. It is an important substrate material for blue, violet, UV and white LED and LD as well as for high Tc superconductive films. Except Y-system, La-system superconductive films, the new superconductive material, MgB film, can also be grown on it while most substrates will be chemical damaged during the film growth process by the chemical atmosphere.

Crystalline Attributes:

Crystal structure

3 m

Cell parameter

a=4.758 Å c=12.983 Å

Melting point

2325oK

Density

3.99g/cm3

Specific Heat

0.757J/g.k

Thermal conductivity

35.1 c 33.0 c W/m.k

Thermal expansion

(10-6k-1)

4.3a,3.9c(294oK)

9.2a,9.3c(757oK)

Dielectric constant (εr)

9.4a,11.5c(295oK)

9.3a,11.3c(80oK)

Dielectric loss (tgδ)

<1x10-6(80oK) Microwave

Hardness (Mohs)

9

Growth Method

Czokralski

Substrate Specifications:

Standard Size: Ф2″,Ф1″, 20x2010x1010x510x3mm… Thickness: 0.5mm1.0mm. Thickness tolerance: +/-0.02mm or 0.005mm for special order; Polish: one or two sides Orientation<10-10> , <1-102> , <11-20>, <0001> Orientation accuracy: +/-0.5o Edge Orientation accuracy: 2oor 1ofor special order Cut with special tilt angle: available(tilt angle:1o45o) Micro roughness Ra;≤5Å(5μmx5μm)


 
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